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    STP804

    Computerized Electron-Beam Linewidth Measuring and Inspection: A New Tool

    Published: 01 January 1983


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    Abstract

    This paper describes a field emission linewidth measuring and inspection instrument. The low-voltage operation, which allows nondestructive measurement of critical dimensions on photoresist with good precision, is described. The effect on photoresist of nonpenetrating electrons in the low-voltage mode versus penetrating electrons in the high-voltage mode is discussed.

    Keywords:

    scanning electron microscope, linewidth measurement, photoresist critical-dimension measurement, field emission source, field emission gun


    Author Information:

    Pomposo, TF
    Product Marketing Manager and President, Nanometrics, Inc., Sunnyvale, Calif.

    Coates, VJ
    Product Marketing Manager and President, Nanometrics, Inc., Sunnyvale, Calif.


    Committee/Subcommittee: F01.06

    DOI: 10.1520/STP36188S