SYMPOSIA PAPER Published: 01 January 1985

Plasma Deposited Inorganic Thin Films for Optical Applications


Plasma deposited thin films, widely used in semiconductor processing, have begun to be used in optical applications such as anti-reflective coatings and optical waveguides. Amorphous films of refractory materials such as SiO2, SiC, and Si3N4 have been applied with high optical perfection on substrates at 200—300°C with this process. Control of index of refraction has been achieved by selecting appropriate deposition parameters.

We describe the plasma deposition process and the properties of these coatings. We present applications and discuss how these coatings may be applied to more demanding optical applications in the future such as graded index films, rugate coatings, and vacuum UV reflecting films. We see that hydrogen inclusion in the films is a factor that must be controlled, and we propose methods to accomplish this.

Author Information

Partlow, WD
Heberlein, JVR
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Developed by Committee: F01
Pages: 417–422
DOI: 10.1520/STP28996S
ISBN-EB: 978-0-8031-4956-4
ISBN-13: 978-0-8031-0930-8