You are being redirected because this document is part of your ASTM Compass® subscription.
    This document is part of your ASTM Compass® subscription.

    If you are an ASTM Compass Subscriber and this document is part of your subscription, you can access it for free at ASTM Compass
    STP1038

    Cluster Beam Deposition for Optical Thin Films

    Published: 01 January 1988


      Format Pages Price  
    PDF (156K) 11 $25   ADD TO CART
    Complete Source PDF (14M) 652 $88   ADD TO CART

    Cite this document

    X Add email address send
    X
      .RIS For RefWorks, EndNote, ProCite, Reference Manager, Zoteo, and many others.   .DOCX For Microsoft Word


    Abstract

    A study has been carried out of the deposition of films of barium fluoride using cluster beam techniques. The effect of different aspects of the deposition process has been assessed including deposition temperature, cluster source geometry and acceleration voltage. X-ray measurements suggest that a transition temperature exists between 200 and 300°C above which dense oriented films of excellent crystallinity are produced. At lower temperatures the films are of a different orientation, are less than theoretical density and are optically inhomogeneous. However an enhancement of laser damage threshold at 1.06μm has been observed for films produced at 200°C. The transition temperature itself can be influenced by cluster source geometry and acceleration voltage used during deposition. The films have been used for anti-reflection of ZnSe substrates and, under optimum conditions, have laser damage thresholds at 10.6μm significantly in excess of the uncoated substrate material.


    Author Information:

    Waddell, EM
    Pilkington Defence Systems Barr & Stroud, Anniesland Glasgow,

    Monachan, BC
    Pilkington Defence Systems Barr & Stroud, Anniesland Glasgow,

    Lewis, KL
    Pilkington Defence Systems Barr & Stroud, Anniesland Glasgow,

    Wyatt-Davies, T
    Pilkington Defence Systems Barr & Stroud, Anniesland Glasgow,

    Pitt, AM
    Pilkington Defence Systems Barr & Stroud, Anniesland Glasgow,


    Committee/Subcommittee: F01.19

    DOI: 10.1520/STP24440S