You are being redirected because this document is part of your ASTM Compass® subscription.
    This document is part of your ASTM Compass® subscription.

    If you are an ASTM Compass Subscriber and this document is part of your subscription, you can access it for free at ASTM Compass
    STP1038

    UV Light Cleaning of Silica Surfaces for Improved Laser Damage of AR Coatings

    Published: 01 January 1988


      Format Pages Price  
    PDF (16K) 1 $25   ADD TO CART
    Complete Source PDF (14M) 652 $88   ADD TO CART

    Cite this document

    X Add email address send
    X
      .RIS For RefWorks, EndNote, ProCite, Reference Manager, Zoteo, and many others.   .DOCX For Microsoft Word


    Abstract

    The glass substrates for the optical coatings have many contaminations on the surface which can not be removed by standard optical cleaning techniques. Especially, it is very difficult to remove the polishing compound which is buried into the silica substrates.

    In this report, the improvement of laser damage threshold due to UV light cleaning is presented. The excimer laser, Xe flashlamps, and Xe arc-lamp have been used as UV light sources. The damage threshold of the AR coating on the silica surface which was cleaned with KrF laser light has increased by 50% at 355 nm.


    Author Information:

    Yoshida, K
    Institute of Laser Engineering, Osaka University, Osaka,

    Yoshida, H
    Institute of Laser Engineering, Osaka University, Osaka,

    Kato, Y
    Institute of Laser Engineering, Osaka University, Osaka,

    Nakai, S
    Institute of Laser Engineering, Osaka University, Osaka,

    Ohtani, M
    Institute of Laser Engineering, Osaka University, Osaka,


    Committee/Subcommittee: F01.10

    DOI: 10.1520/STP24419S