SYMPOSIA PAPER Published: 01 January 1990

Measurements of UV Induced Absorption in Dielectric Coatings


We discuss the first results obtained from a new testing facility for measuring the induced absorption in multilayer dielectric coatings exposed to intense UV radiation. The absorption loss is measured in-situ during exposure, as a function of time for various UV photon energies, intensities, and sample materials. The sample is irradiated by the direct beam from the TOK undulator at NSLS and measured in-vacuo. The undulator is typically run at K = 1 (so that the harmonic emission is low) to simplify the data analysis. The test chamber is separated from the undulator beamline by a differentially pumped line which permits the introduction of carbonaceous gases into the chamber at pressures up to 10-5 Torr. By varying the current and energy of the stored electrons, one can adjust the intensity and photon energy of the undulator first harmonic in the range up to 1.2 w/cm2, and between about 5 eV and 35 eV.

Author Information

Bakshi, MH
Cecere, M
Deacon, DAG
Fauchet, AM
NSLS, Brookhaven National Lab, Upton, NY
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Developed by Committee: E13
Pages: 551–560
DOI: 10.1520/STP26520S
ISBN-EB: 978-0-8031-5157-4
ISBN-13: 978-0-8031-4478-1