SYMPOSIA PAPER Published: 01 January 1990

A High Temperature, Plasma-Assisted Chemical Vapor Deposition System


We have designed and built a high-temperature, plasma-assisted, chemical vapor deposition system to deposit multilayer optical coatings of SiO2 and doped-SiO2 on flat substrates. The coater concept and design is an outgrowth of our recent work with Schott Glaswerke demonstrating the use of plasma assisted CVD to prepare very high damage threshold optical coatings. (That work is reported in a companion paper at this Symposium).

Author Information

Brusasco, RM
Britten, JA
Thorsness, CB
Scrivener, MS
Unites, WG
Campbell, JH
Johnson, WL
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Developed by Committee: E13
Pages: 443–454
DOI: 10.1520/STP26512S
ISBN-EB: 978-0-8031-5157-4
ISBN-13: 978-0-8031-4478-1