SYMPOSIA PAPER Published: 01 January 1990

Angular Dependence of Thin-Film Dielectric Coating Damage Thresholds Revisited


Newnam et al. [1] reported experiments showing that the angular dependence of 351-nm laser damage thresholds in HfO2/SiO2 multilayer dielectric reflectors was much weaker than even the 1/cosθ expected from simple geometric fluence dilution. Several plausible explanations were suggested, but none were convincing. We propose a simple geometric model based on a cylindrical form for the coating defect responsible for damage initiation. We have measured 248-nm damage thresholds for bare fused silica, evaporated aluminium films, and HfO2/SiO2 and Al2O3/SiO2 dielectric reflectors at angles out to 85°. The measured data agree well with our simple model.

Author Information

Boyer, JD
Foltyn, SR
Mauro, BR
Sanders, VE
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Developed by Committee: E13
Pages: 417–424
DOI: 10.1520/STP26509S
ISBN-EB: 978-0-8031-5157-4
ISBN-13: 978-0-8031-4478-1