SYMPOSIA PAPER Published: 01 January 1987

Particulate Control in VLSI Gases


Semiconductor device miniaturization has required continually decreasing levels of particulate contamination in process gases. This paper briefly reviews existing technologies for analyzing and for minimizing particles in VLSI gas streams. Recent advances and research topics in both areas are also addressed. Examples from laboratory and field evaluations of VLSI and non-VLSI systems are discussed.

Author Information

Davidson, JM
Ruane, TP
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Developed by Committee: F01
Pages: 436–450
DOI: 10.1520/STP25782S
ISBN-EB: 978-0-8031-5021-8
ISBN-13: 978-0-8031-0459-4