SYMPOSIA PAPER Published: 01 January 1986
STP23122S

High Damage Threshold Porous Silica Antireflective Coating

Source

A quarterwave-thick, narrow-bandwidth, antireflective coating for fused silica optical components and KDP crystals has been developed. The coating consists of porous silica prepared from a silica sol in ethanol. It is applied by dip or spin from a solution at room temperature and requires no further treatment. The damage threshold levels are about equal to the surface damage thresholds of the uncoated substrates.

Author Information

Thomas, IM
Lawrence Livermore National Laboratory, Livermore, California
Wilder, JG
Lawrence Livermore National Laboratory, Livermore, California
Lowdermilk, WH
Lawrence Livermore National Laboratory, Livermore, California
Staggs, MC
Lawrence Livermore National Laboratory, Livermore, California
Price: $25.00
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Details
Developed by Committee: F01
Pages: 205–210
DOI: 10.1520/STP23122S
ISBN-EB: 978-0-8031-4997-7
ISBN-13: 978-0-8031-0960-5