SYMPOSIA PAPER Published: 01 January 1988

Chemical Vapor Deposition of TiO Thin Films at Room Temperature


Titania coatings were prepared using a chemical vapor deposition (CVD) apparatus at room temperature. Coating were deposited by the reaction of gaseous TiCl4 and H2O at the substrate surface. High refractive indices were obtained with damage thresholds to 12.9 J/cm2, at 1.06 μm, 1 ns.

Author Information

Wilder, J
Thomas, I
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Developed by Committee: F01
Pages: 387–391
DOI: 10.1520/STP18578S
ISBN-EB: 978-0-8031-5032-4
ISBN-13: 978-0-8031-4477-4