SYMPOSIA PAPER Published: 01 January 1988

Admixture of SiO to Suppress TiO Crystallization


Crystallization of glassy TiO2 films used in optical coatings can be a problem in high power applications and may be a major limitation to the laser damage threshold. An attempt to suppress such crystallization involved mixing small amounts of SiO2 into TiO2 during the ion-beam sputter deposition process. An admixture of 5% SiO2 increased the crystallization onset temperature, determined by Raman spectroscopy, by approximately 150°C. The refractive index was relatively unaffected by the addition of 5% SiO2, dropping from 2.42 to 2.38. Optical loss, which shows a sharp increase near 350°C for pure TiO2, did not increase measurably for the films with SiO2 admixture of 5% or greater.

Author Information

Sites, JR
Postek, JS
Robinson, RS
Schemmel, TD
She, CY
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Developed by Committee: E13
Pages: 332–335
DOI: 10.1520/STP18571S
ISBN-EB: 978-0-8031-5032-4
ISBN-13: 978-0-8031-4477-4