SYMPOSIA PAPER Published: 01 January 1988

Highly Damage Resistant Anti-reflection Coating on the Chemically Etched Surface for High Power Lasers


When the surface of BK-7 glass is conventionally polished by CeO2 as polishing compound, the polishing compound is buried into the substrate. The buried compound can not be removed by standard optical cleaning techniques. Therefore, when the polished surface is anti-reflection (AR) coated and exposed to the focussed laser beam, the surface ionization occurs due to absorption at the isolated sites, leading to laser induced damages in the AR coating.

In order to improve the damage threshold, we have prepared the BK-7 substrate which was chemically etched after polishing. The damage threshold of the AR coating on the etched surface showed 1.5∼2 times improvement compared with that of un-etched surface, at the laser wavelength of 1.06 &m and 1 ns pulse width. Due to the special etching technique, the surface roughness of the etched surface was 10∼15 Årms, which was close to the surface roughness before etching (7∼12 Årms).

Author Information

Yoshida, K
Yoshida, H
Kato, Y
Yamanaka, C
Ohtani, M
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Developed by Committee: F01
Pages: 271–271
DOI: 10.1520/STP18562S
ISBN-EB: 978-0-8031-5032-4
ISBN-13: 978-0-8031-4477-4