SYMPOSIA PAPER Published: 01 January 1992

Formation of Copper Sulfide in Moist Air-Sulfur Dioxide


Films formed on copper exposed to various sulfur-bearing environments were analyzed by XPS and electrochemical reduction to study the formation of copper sulfide. The S-2p photoelectron band showed the presence of copper sulfide in the film in addition to oxysulfur species. Coulometric reduction analysis of the film suggested that the sulfide was nonstoichiometric. The formation of copper sulfide was also noted on copper immersed in “sulfurous” acid and in sulfuric acid. The properties of the sulfide that formed reductively on copper from these oxysulfur environments were compared with those of copper sulfide that formed from a moist hydrogen sulfide environment. Formation of copper sulfide from the oxysulfur environments showed that sulfur could participate as a reducible species in the film-forming corrosion reactions.

Author Information

Chawla, SK
Tata Energy Research Institute, New Delhi, India
Rickett, BI
Case Western Reserve University, Cleveland, OH
Payer, JH
Case Western Reserve University, Cleveland, OH
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Developed by Committee: G01
Pages: 21–35
DOI: 10.1520/STP15052S
ISBN-EB: 978-0-8031-5205-2
ISBN-13: 978-0-8031-1470-8