Journal Published Online: 01 September 1975
Volume 3, Issue 5

A Technique for Examining Submicron Particulate Matter on Semiconductor Device Wafers

CODEN: JTEVAB

Abstract

A technique is described for locating and consequently removing submicron particulate matter from semiconductor device wafers. Chemical and structural analyses of these particulates are obtained from energy dispersive X-ray spectra and selected area electron diffraction patterns, respectively.

Author Information

Berenbaum, L
IBM System Products Division—East Fishkill, Hopewell Junction, N.Y.
Pages: 3
Price: $25.00
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Details
Stock #: JTE10180J
ISSN: 0090-3973
DOI: 10.1520/JTE10180J