| ||Format||Pages||Price|| |
|2||$41.00||  ADD TO CART|
|Hardcopy (shipping and handling)||2||$41.00||  ADD TO CART|
1.1 This standard consists of terms and definitions pertaining to measurements taken on thin, reflecting films, such as found in microelectromechanical systems (MEMS) materials. In particular, the terms are related to the standards in Section , which were generated by Committee E08 on Fatigue and Fracture. Terminology Relating to Fatigue and Fracture Testing is applicable to this standard.
1.2 The terms are listed in alphabetical order.
1.3 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
E1823 Terminology Relating to Fatigue and Fracture Testing
E2244 Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer
E2245 Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer
E2246 Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer
ICS Number Code 01.040.31 (Electronics (Vocabularies)); 31.240 (Mechanical structures for electronic equipment)
UNSPSC Code 32111700(Semiconductor devices)
|Link to Active (This link will always route to the current Active version of the standard.)|
ASTM E2444-11(2018), Standard Terminology Relating to Measurements Taken on Thin, Reflecting Films, ASTM International, West Conshohocken, PA, 2018, www.astm.orgBack to Top