ASTM E1127 - 08(2015)

    Standard Guide for Depth Profiling in Auger Electron Spectroscopy

    Active Standard ASTM E1127 | Developed by Subcommittee: E42.03

    Book of Standards Volume: 03.06

      Format Pages Price  
    PDF 5 $52.00   ADD TO CART
    Hardcopy (shipping and handling) 5 $52.00   ADD TO CART

    Significance and Use

    5.1 Auger electron spectroscopy yields information concerning the chemical and physical state of a solid surface in the near surface region. Nondestructive depth profiling is limited to this near surface region. Techniques for measuring the crater depths and film thicknesses are given in (1).5

    5.2 Ion sputtering is primarily used for depths of less than the order of 1 μm.

    5.3 Angle lapping or mechanical cratering is primarily used for depths greater than the order of 1 μm.

    5.4 The choice of depth profiling methods for investigating an interface depends on surface roughness, interface roughness, and film thickness (2).

    5.5 The depth profile interface widths can be measured using a logistic function which is described in Practice E1636.

    1. Scope

    1.1 This guide covers procedures used for depth profiling in Auger electron spectroscopy.

    1.2 Guidelines are given for depth profiling by the following:



    Ion Sputtering 


    Angle Lapping and Cross-Sectioning 


    Mechanical Cratering 


    Mesh Replica Method


    Nondestructive Depth Profiling 


    1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.

    1.4 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

    2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.

    ASTM Standards

    E673 Terminology Relating to Surface Analysis

    E684 Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces

    E827 Practice for Identifying Elements by the Peaks in Auger Electron Spectroscopy

    E996 Practice for Reporting Data in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy

    E1078 Guide for Specimen Preparation and Mounting in Surface Analysis

    E1577 Guide for Reporting of Ion Beam Parameters Used in Surface Analysis

    E1634 Guide for Performing Sputter Crater Depth Measurements

    E1636 Practice for Analytically Describing Depth-Profile and Linescan-Profile Data by an Extended Logistic Function

    E1829 Guide for Handling Specimens Prior to Surface Analysis

    ISO Standard

    ISO/TR 22335: 2007 Surface Chemical Analysis--Depth Profiling--Measurement of Sputtering Rate: Mesh-Replica Method Using a Mechanical Stylus Profilometer

    ICS Code

    ICS Number Code 71.040.50 (Physicochemical methods of analysis)

    UNSPSC Code

    UNSPSC Code

    Referencing This Standard
    Link Here
    Link to Active (This link will always route to the current Active version of the standard.)

    DOI: 10.1520/E1127-08R15

    Citation Format

    ASTM E1127-08(2015), Standard Guide for Depth Profiling in Auger Electron Spectroscopy, ASTM International, West Conshohocken, PA, 2015,

    Back to Top