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Significance and Use
4.1 This guide recommends the water quality required for the electronics and microelectronics industries. High-purity water is required to prevent contamination of products during manufacture, since contamination can lead to an unacceptable, low yield of electronic devices.
4.2 The range of water purity is defined in accordance with the manufacturing process. The types of ultra-pure water are defined with respect to device line width. In all cases, the water-quality recommendations apply at the point of distribution.
4.3 The limits on the impurities are related to current contamination specifications and to available analytical methods (either performed in a suitable clean laboratory or by on-line instrumentation). On-line and off-line methods are used in accordance with current industry practice. Concentration of the sample may be required to measure the impurities at the levels indicated in .
All values are equal to or less than with the exception of Resistivity.
1.1 This guide provides recommendations for water quality related to electronics and semiconductor-industry manufacturing. Seven classifications of water are described, including water for line widths as low as 0.032 μm. In all cases, the recommendations are for water at the point of distribution (POD).
1.2 Water is used for washing and rinsing of semiconductor components during manufacture. Water is also used for cleaning and etching operations, making steam for oxidation of silicon surfaces, preparing photomasks, and depositing luminescent materials. Other applications are in the development and fabrication of solid-state devices, thin-film devices, communication lasers, light-emitting diodes, photo-detectors, printed circuits, memory devices, vacuum-tube devices, or electrolytic devices.
1.3 Users needing water qualities different from those described here should consult other water standards, such as Specification and Guide .
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.
1.5 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
D1129 Terminology Relating to Water
D1193 Specification for Reagent Water
D1976 Test Method for Elements in Water by Inductively-Coupled Plasma Atomic Emission Spectroscopy
D2791 Test Method for On-line Determination of Sodium in Water
D3919 Practice for Measuring Trace Elements in Water by Graphite Furnace Atomic Absorption Spectrophotometry
D4191 Test Method for Sodium in Water by Atomic Absorption Spectrophotometry
D4192 Test Method for Potassium in Water by Atomic Absorption Spectrophotometry
D4327 Test Method for Anions in Water by Suppressed Ion Chromatography
D4453 Practice for Handling of High Purity Water Samples
D4517 Test Method for Low-Level Total Silica in High-Purity Water by Flameless Atomic Absorption Spectroscopy
D5173 Guide for On-Line Monitoring of Total Organic Carbon in Water by Oxidation and Detection of Resulting Carbon Dioxide
D5196 Guide for Bio-Applications Grade Water
D5391 Test Method for Electrical Conductivity and Resistivity of a Flowing High Purity Water Sample
D5462 Test Method for On-Line Measurement of Low-Level Dissolved Oxygen in Water
D5542 Test Methods for Trace Anions in High Purity Water by Ion Chromatography
D5544 Test Method for On-Line Measurement of Residue After Evaporation of High-Purity Water
D5673 Test Method for Elements in Water by Inductively Coupled PlasmaMass Spectrometry
D5996 Test Method for Measuring Anionic Contaminants in High-Purity Water by On-Line Ion Chromatography
D5997 Test Method for On-Line Monitoring of Total Carbon, Inorganic Carbon in Water by Ultraviolet, Persulfate Oxidation, and Membrane Conductivity Detection
F1094 Test Methods for Microbiological Monitoring of Water Used for Processing Electron and Microelectronic Devices by Direct Pressure Tap Sampling Valve and by the Presterilized Plastic Bag Method
ICS Number Code 13.060.25 (Water for industrial use); 71.100.99 (Other products of the chemical industry)
|Link to Active (This link will always route to the current Active version of the standard.)|
ASTM D5127-13(2018), Standard Guide for Ultra-Pure Water Used in the Electronics and Semiconductor Industries, ASTM International, West Conshohocken, PA, 2018, www.astm.orgBack to Top