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    Materials and Electron Device Processing

    Standing S.
    Published: 1961

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    Table of Contents

    The Role of Impurities in Impurity-Dominated Electronic Materials and Devices

    Particulate Concentrations in Ultraclean Rooms

    A Comparison of Electrostatic and High-Efficiency Impingement Air Filters for Use in Device Development Laboratories

    Dust Monitoring by the Dry Slide Settling Technique

    An Approach to Control of Transistor Processing Environments

    Electron Beam Microanalyzer: A New Tool for Electron Device Development

    Detection of Inorganic Contamination on Surfaces by an EMF Measurement

    Electrode Potential: A Tool for the Control of Materials and Processes in Electron Device Fabrication: I. EMF—Time Studies of Clean and Contaminated Platinum Electrodes

    Electrode Potential: A Tool for the Control of Materials and Processes in Electron Device Fabrication: II. EMF Studies of the Behavior of 36 Per Cent Nickel-Iron Alloy in Hydrogen Peroxide — Formic Acid Etchants

    Use of Radioisotope Tracer Techniques in Contamination Studies

    Gas-Phase Proportional Counting: A Radiotracer Technique for Examination of Electronic Components and Materials

    Fluorine Release from Glasses

    Elimination of Contaminants from Electron Tube Components: Automation of Chemical Processing

    Transducer Parameters Affecting Sonic Cleaning

    Removal of Water-Soluble Flux from Assembled Printed Circuit Boards

    Size Distribution and Identification of Air-Borne Particulates

    ARC Sealing of Borosilicate Glasses

    Recommended Practices for Safe Handling of Beryllium Oxide Ceramics

    Beryllium Oxide Dielectric Heat Sinks for Electronic Devices

    Sulfamic Acid Cleaning of Electron Tube Parts

    A 24-Position Semiautomatic Vacuum Tube Exhaust Machine

    Purification, Distribution, Control, and Monitoring of High-Purity Gases for Electron Device Processing

    Comparison of Standard Leak Rates Measured by Viscous and Molecular Flow Techniques

    Gas Composition During Pumping and in Sealed-off Power Tubes

    Determination of Trace Amounts of Oxygen in Protective Gaseous Ambients

    Mass Spectrometric Studies of Power Klystron Exhaust Processing

    Quality Control of Getters

    Residual Gas Content as a Function of Tube Processing

    Changes in Stability of Germanium Alloy Transistors Through Etching, Washing, and Encapsulation Processing

    Effects of Various Cleaning Methods on Electronic Components in the Micromodule

    Noise-Tested Cathode Activation

    Appendix: Organization of Committee F-1 on Materials for Electron Tubes and Semiconductor Devices

    Committee: F01

    DOI: 10.1520/STP300-EB

    ISBN-EB: 978-0-8031-5963-1

    ISBN-13: 978-0-8031-6117-7