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A device has been developed by which an ionized gas jet is directed upon a surface to be cleaned, as a means of removing residual contaminants. Applicable to any type of surface, either metallic or insulating, it offers several other advantages over the methods previously used to effect ionic cleaning of surfaces. The apparatus is described; the evaluation of its use with various gases is given; and the results of its application to the preparation of surfaces for the reception of vacuum-evaporated films are presented.
Krieger, G. L.
Sandia Corp., Albuquerque, N. Mex.