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    Purification, Distribution, Control, and Monitoring of High-Purity Gases for Electron Device Processing

    Published: 01 January 1961

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    Methods of purifying and controlling the quality of high-purity gases used in electron device manufacture are presented. Specially designed gas purification systems for removing oxygen, water, and other contaminants to below 1 ppm are in use. Techniques are described for cleaning, installing, and maintaining pipes, valves, and all auxiliary equipment in contact with the gases.

    Permeability data for oxygen and water vapor through a variety of plastics and elastomers are being applied to control the type of materials used in the gas system through the point of use. All centrally supplied gases are continuously monitored for oxygen, water, and hydrocarbons in the 1-ppm range. Special equipment and techniques were developed to analyze gases for these contaminants in the 0.2 to 1.0-ppm range. Portable analysis equipment is used to check gas quality at any point in the plant. Other analyses are made by the analytical laboratory. Procedures and pamphlets were written and seminars and lectures were held to help implement the complete program.

    Author Information:

    Rogers, Mal D.
    Supervisor, Texas Instruments Inc., Dallas, Tex

    Committee/Subcommittee: F01.06

    DOI: 10.1520/STP41238S