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    The Deposition of Diamondlike Carbon Thin Films on CaF2

    Published: 01 January 1983

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    As part of an AFML program, deposition conditions were studied to produce diamondlike carbon thin films on CaF2. Halide materials are difficult to deposit diamondlike carbon coatings onto because of the moderate or large coefficient of thermal expansion of the halides which causes thermal induced separation of the coating. In addition, the adhesion of the carbon films to CaF2 is poor. Several pretreatments were attempted to improve adhesion without much success. We describe a simple thermal technique that resulted in carbon films adhering most of the time to CaF2 mechanical test bars and optical discs. The problem of adherence, however, has not been solved for this film-substrate system.


    Diamondlike carbon, Carbon, Thin Film, CaF, 2, Hard Coating, Laser Calorimetry, Plasma Deposition

    Author Information:

    Moravec, TJ
    Honeywell Corporate Technology Center, Bloomington, MN

    Committee/Subcommittee: F01.02

    DOI: 10.1520/STP37275S