You are being redirected because this document is part of your ASTM Compass® subscription.
    This document is part of your ASTM Compass® subscription.

    If you are an ASTM Compass Subscriber and this document is part of your subscription, you can access it for free at ASTM Compass
    STP850

    Edge-Controlled, Self-Consistent Proximity Effect Corrections

    Published: 01 January 1984


      Format Pages Price  
    PDF (276K) 19 $25   ADD TO CART
    Complete Source PDF (9.7M) 664 $66   ADD TO CART

    Cite this document

    X Add email address send
    X
      .RIS For RefWorks, EndNote, ProCite, Reference Manager, Zoteo, and many others.   .DOCX For Microsoft Word


    Abstract

    A new method for correcting electron-beam lithography pattern data for proximity effects is presented. The method calculates the average dose received by each partition exterior edge to be equal to the critical dose necessary for proper exposure. This method minimizes the number of partitioned rectangles required for acceptable lithography, thus greatly reducing CPU time. Electron-beam dose averages are not only determined for critical edges where exposure conditions are stringent, but also for the rest of the partitioned edges where tolerances are more relaxed. Both simulated and experimental results will be presented.

    Keywords:

    electron-beam, lithography, proximity effect


    Author Information:

    Berkowitz, HL
    research physical scientistschemistelectrical engineer, US Army Electronics Technology and Devices Laboratory (ERADCOM), Fort Monmouth, New Jersey

    Cook, CF
    research physical scientistschemistelectrical engineer, US Army Electronics Technology and Devices Laboratory (ERADCOM), Fort Monmouth, New Jersey

    Kwiatkowski, JH
    research physical scientistschemistelectrical engineer, US Army Electronics Technology and Devices Laboratory (ERADCOM), Fort Monmouth, New Jersey

    Goodreau, WM
    research physical scientistschemistelectrical engineer, US Army Electronics Technology and Devices Laboratory (ERADCOM), Fort Monmouth, New Jersey


    Committee/Subcommittee: F01.06

    DOI: 10.1520/STP32648S