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    STP1117

    A High Temperature, Plasma-Assisted Chemical Vapor Deposition System

    Published: 01 January 1990


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    Abstract

    We have designed and built a high-temperature, plasma-assisted, chemical vapor deposition system to deposit multilayer optical coatings of SiO2 and doped-SiO2 on flat substrates. The coater concept and design is an outgrowth of our recent work with Schott Glaswerke demonstrating the use of plasma assisted CVD to prepare very high damage threshold optical coatings. (That work is reported in a companion paper at this Symposium).


    Author Information:

    Brusasco, RM
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Britten, JA
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Thorsness, CB
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Scrivener, MS
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Unites, WG
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Campbell, JH
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Johnson, WL
    University of California Lawrence Livermore National Laboratory, Livermore, CA


    Committee/Subcommittee: E13.15

    DOI: 10.1520/STP26512S