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    STP1117

    The Effect of Laser Annealing on Laser Induced Damage Threshold

    Published: 01 January 1990


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    Abstract

    A significant enhancement of the single shot Laser Induced Damage Threshold of CaF2 and fused silica and a moderate enhancement for GaAs and Al has been observed as the result of laser annealing using an excimer laser operating at 248 nm. This phenomenon is primarily attributed to a reduction of the residual surface roughness of the samples.

    Keywords:

    Excimer laser, Laser beam annealing, Laser induced damage


    Author Information:

    Kerr, NC
    Loughborough University of Technology, Loughborough, Leicestershire

    Emmony, DC
    Loughborough University of Technology, Loughborough, Leicestershire


    Committee/Subcommittee: E13.15

    DOI: 10.1520/STP26484S