SYMPOSIA PAPER Published: 01 January 1978
STP25608S

X-Ray Photoelectron Spectroscopy and Secondary Ion Mass Spectrometry: A Multitechnique Approach to Surface Analysis

Source

The combination of X-ray photoelectron spectroscopy (XPS) with secondary ion mass spectroscopy (SIMS) promises to provide a powerful new approach both to quantitative analysis of surface composition and to the elucidation of surface molecular structure. In this work, we have tested our ultrahigh vacuum XPS/SIMS system to characterize a variety of metal, alloy, and metal oxygen surfaces. We report on the examination of clean silver surfaces where ions of clusters up to Agn+ where n = 1 to 5 have been observed. Studies have also been carried out on iron/ruthenium catalyst surfaces and on clean indium foils exposed to controlled doses of oxygen. In general, we have tried to illustrate the advantages of this combined technique.

Author Information

Shepard, A
School of Chemical Engineering, Purdue University, West Lafayette, Ind
Hewitt, RW
School of Chemical Engineering, Purdue University, West Lafayette, Ind
Baitinger, WE
School of Chemical Engineering, Purdue University, West Lafayette, Ind
Slusser, GJ
School of Chemical Engineering, Purdue University, West Lafayette, Ind
Winograd, N
School of Chemical Engineering, Purdue University, West Lafayette, Ind
Ott, GL
School of Chemical Engineering, Purdue University, West Lafayette, Ind
Delgass, WN
School of Chemical Engineering, Purdue University, West Lafayette, Ind
Price: $25.00
Contact Sales
Related
Reprints and Permissions
Reprints and copyright permissions can be requested through the
Copyright Clearance Center
Details
Developed by Committee: E42
Pages: 187–203
DOI: 10.1520/STP25608S
ISBN-EB: 978-0-8031-4715-7
ISBN-13: 978-0-8031-0543-0