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    STP1038

    The Properties of Laser Annealed Dielectric Films

    Published: 01 January 1988


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    Abstract

    The annealing of dielectric thin film coatings has been explored in an attempt to identify the potential benefits of this method of post deposition treatment. Single layer coatings fabricated using several different deposition techniques were annealed and subsequently characterized. All properties so determined evidenced substantial changes as a result of the annealing process. Film microstructure, optical absorption levels, and laser damage thresholds varied considerably with annealing power levels. Although oven annealing is known to improve the performance of certain types of multilayer films, significant improvements were seen only in certain films over a limited range of annealing conditions. As a consequence of this, there were changes in other important optical properties, which will be discussed as well.

    Keywords:

    laser annealing, thin films, optical properties, laser damage


    Author Information:

    Stewart, AF
    Air Force Weapons Laboratory, Kirtland AFB, NM

    Guenther, AH
    Air Force Weapons Laboratory, Kirtland AFB, NM

    Domann, FE
    Air Force Weapons Laboratory, Kirtland AFB, NM


    Committee/Subcommittee: F01.19

    DOI: 10.1520/STP24446S