Published: 01 January 1988
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Cite this document
We prepared films of alumina, zirconia and hafnia by Chemical Vapor Deposition (CVD) for evaluation as high refractive index optical components for high power laser applications. Films with high index of refraction (1.89-1.63) but with rather low single shot laser damage thresholds (4–10 J/cm-2) were prepared by high temperature (400%C) thermal decomposition. Lower temperature deposition with chemical assist improves some optical properties and laser damage thresholds at the expense of a lower index of refraction.
chemical vapor deposition, alumina, hafnia, zirconia, laser damage
Lawrence Livermore National Laboratory University of California, Livermore, California