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    STP1038

    Ion Assisted Deposition of Optical Thin Films at Reduced Substrate Temperature

    Published: 01 January 1988


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    Abstract

    Ion assisted deposition (IAD) involves bombarding a thin film with low energy ions (Ei <1 keV) while it is being deposited. We have investigated the application of this technique to deposit optical thin films onto substrates at low temperature (T < 150°C). Since conventional deposition methods require heating the substrate to temperatures of −300°C, IAD is important for coating substrate materials that cannot be subjected to elevated temperature.

    In this study, we have observed that optical coatings of A12O3, Ta2O5 and TiO2 deposited at low temperature using IAD have higher values of refractive index compared to similar films produced without IAD. In addition, the optical absorption of Al203 and Ta2O5 thin films can be decreased by applying IAD to deposit these materials. We were unable to detect visible absorption of TiO2 thin films produced in this study. We also present results correlating Raman spectra and optical scatter of these films to IAD conditions. Which suggests that IAD TiO2 at low temperature can promote anatase crystallites in the film, with a corresponding increase in optical scatter.


    Author Information:

    Williams, FL
    University of New Mexico Center for High Technology Materials, Albuquerque, NM

    McNeil, JR
    University of New Mexico Center for High Technology Materials, Albuquerque, NM

    McNally, JJ
    University of New Mexico Center for High Technology Materials, Albuquerque, NM

    Exarhos, GJ
    University of New Mexico Center for High Technology Materials, Albuquerque, NM


    Committee/Subcommittee: F01.19

    DOI: 10.1520/STP24434S