SYMPOSIA PAPER Published: 01 January 1986
STP23119S

Some Recent Observations on the Properties of UHV-Deposited ZrO

Source

Single-layer ZrO2 coatings were deposited in an ultrahigh vacuum system by two techniques: laser evaporation (utilizing a 100-W, continuous wave, CO2 laser) and electron-beam evaporation. Substrate temperatures were maintained at either 150°C or 250°C with backfill oxygen pressures between 0 and 5×10−5 torr. The coatings were analyzed by Auger Electron Spectroscopy to determine stoichiometry and to provide information on the nature and level of impurities. The refractive indices for the coatings were determined by ellipsometry at 6328 Å. Selected coatings were damage tested at 531 nm.

This report discusses the influence of backfill pressure, substrate temperature and evaporation technique on thin film properties and compares the results obtained by Auger and ellipsometric analyses. Also presented is a comparison between films prepared under high vacuum and ultrahigh vacuum conditions.

Author Information

Raj, T
Weaver, LD
Tuenge, SR
Price, JS
Jungling, KC
Price: $25.00
Contact Sales
Related
Reprints and Permissions
Reprints and copyright permissions can be requested through the
Copyright Clearance Center
Details
Developed by Committee: F01
Pages: 171–179
DOI: 10.1520/STP23119S
ISBN-EB: 978-0-8031-4997-7
ISBN-13: 978-0-8031-0960-5