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    STP1028

    Chemical Vapor Deposition of TiO2 Thin Films at Room Temperature

    Published: 01 January 1988


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    Abstract

    Titania coatings were prepared using a chemical vapor deposition (CVD) apparatus at room temperature. Coating were deposited by the reaction of gaseous TiCl4 and H2O at the substrate surface. High refractive indices were obtained with damage thresholds to 12.9 J/cm2, at 1.06 μm, 1 ns.

    Keywords:

    thin films, chemical vapor deposition, titanium dioxide, laser damage


    Author Information:

    Wilder, J
    Lawrence Livermore National Laboratory University of California, Livermore, California

    Thomas, I
    Lawrence Livermore National Laboratory University of California, Livermore, California


    Committee/Subcommittee: F01.10

    DOI: 10.1520/STP18578S