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    STP1028

    Influence of Post-deposition Treatment by UV Light and Oxygen (ozone) on 350 nm Damage Thresholds of SiO2 Films Deposited From Sols

    Published: 01 January 1988


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    Abstract

    Certain multilayer porous silica AR coatings on fused silica substrates prepared by the sol-gel process have been found to have a much lower laser damage threshold than single layer coatings prepared by the same method. Treatment with UV light in the presence of oxygen (which gives ozone) at low temperature was found to restore damage thresholds to the levels found in single layers. Damage thresholds were measured at 350 nm with a 25 ns pulse for 1000 shots at 25 Hz. The effect of exposure time and other factors such as replacement of oxygen with nitrogen and vacuum are described.

    Keywords:

    laser damage, SiO, 2, sol-gel, AR coatings


    Author Information:

    Thomas, I
    Lawrence Livermore National Laboratory University of California, Livermore, California

    Wilder, J
    Lawrence Livermore National Laboratory University of California, Livermore, California

    Lee, A
    Lawrence Livermore National Laboratory University of California, Livermore, California

    George, D
    Lawrence Livermore National Laboratory University of California, Livermore, California


    Committee/Subcommittee: F01.10

    DOI: 10.1520/STP18567S