| ||Format||Pages||Price|| |
|PDF (540K)||17||$25||  ADD TO CART|
|Complete Source PDF (3.2M)||162||$55||  ADD TO CART|
Cite this document
Aqueous cleaning processes were developed to replace chlorinated fluorocarbon solvents for cleaning industrial valves and fittings. Additional processes were developed for the ultra-clean requirements of special applications such as oxygen systems, high-purity electronic gases, and biotechnology processes. Development of cleaning processes and methods is described. Test methods developed to qualify and control the processes and verify the resultant products are described. Data on hydrocarbon residues, particle contamination, ionic residues, and adsorbed moisture are presented. Comparative data for solvent cleaning methods are presented to show that the aqueous cleaning processes are superior to traditional methods.
aqueous cleaning, chlorofluorocarbon (CFC) solvents, deionized (DI) water, high-purity electronic gases, hydrocarbon analysis, ionic cleanliness, moisture analysis, oxygen service, ozone-depleting compounds, particle counting, semiconductor, Soxhlet extraction
Senior Engineer, Nupro Co., Willoughby, OH
Contamination Control Engineer, Nupro Co., Willoughby, OH