You are being redirected because this document is part of your ASTM Compass® subscription.
    This document is part of your ASTM Compass® subscription.

    If you are an ASTM Compass Subscriber and this document is part of your subscription, you can access it for free at ASTM Compass

    Scanning Atomic-Force Microscopy on Initiation and Growth Behavior of Fatigue Slip-Bands in α-Brass

    Published: 01 January 2002

      Format Pages Price  
    PDF (436K) 14 $25   ADD TO CART
    Complete Source PDF (9.3M) 402 $265   ADD TO CART

    Cite this document

    X Add email address send
      .RIS For RefWorks, EndNote, ProCite, Reference Manager, Zoteo, and many others.   .DOCX For Microsoft Word


    Slip-band formation and fatigue crack-initiation processes in α-brass were observed by means of atomic force microscopy (AFM), and the effects of the grain size and the stress amplitude were discussed. In a fine grain material, fatigue cracks were initiated only from slip-bands. In a coarse grain material, however, they were initiated either from slip-bands or grain boundaries. The depth of an intrusion drastically increased with its outgrowth to a crack, and with coalescence of cracks, the width of cracks increased rapidly.

    The depth of an intrusion increased with the number of loading cycles, and when the depth reaches a critical value, a transgranular crack was initiated from the intrusion. The critical value was given as a function of the slip-band angle relative to the stress axis. From the AFM observations, it was found that the critical value of the slip distance was independent of the slip-band angle relative to the stress axis, the stress amplitude, and the grain-size. For crack-initiations from grain boundaries, however, the value of the grain boundary depth at the crack initiation was not a unique function of the grain boundary angle relative to the stress axis.


    fatigue, micromechanics, crack-initiation, slip-band, α-brass, AFM, nanotechnology

    Author Information:

    Nakai, Y
    Professor, Kobe University, Kobe,

    Kusukawa, T
    Staff, Yamatake Building Systems, Co., Ltd., Tokyo,

    Hayashi, N
    Staff, Minolta Co., Ltd., Osaka,

    Committee/Subcommittee: E08.06

    DOI: 10.1520/STP10587S