Standard Historical Last Updated: Aug 16, 2017 Track Document
ASTM F2113-01e1

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications F2113-01E01 ASTM|F2113-01E01|en-US Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications Standard new BOS Vol. 10.04 Committee F01
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Scope

1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.

1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.

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Details
Book of Standards Volume: 10.04
Developed by Subcommittee: F01.17
Pages: 2
DOI: 10.1520/F2113-01E01
ICS Code: 29.045