Standard Historical Last Updated: Dec 31, 2010 Track Document
ASTM F1709-97(2002)

Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications F1709-97R02 ASTM|F1709-97R02|en-US Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications Standard new BOS Vol. 10.04 Committee F01
$ 66.00 In stock

Scope

1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.

1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.

Price:
Contact Sales
Related
Reprints and Permissions
Reprints and copyright permissions can be requested through the
Copyright Clearance Center
Details
Book of Standards Volume: 10.04
Developed by Subcommittee: F01.17
Pages: 3
DOI: 10.1520/F1709-97R02
ICS Code: 31.120