Standard Historical Last Updated: Aug 16, 2017 Track Document
ASTM F1238-95(1999)

Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications

Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications F1238-95R99 ASTM|F1238-95R99|en-US Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications Standard new BOS Vol. 10.04 Committee F01
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Scope

1.1 This specification covers sputtering targets fabricated from metallic silicides (molybdenum silicide, tantalum silicide, titanium silicide, and tungsten silicide). These targets are referred to as refractory silicide targets, and are intended for use in microelectronic applications.

1.2 The values stated in SI units are regarded as standard.

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Details
Book of Standards Volume: 10.04
Developed by Subcommittee: F01.17
Pages: 2
DOI: 10.1520/F1238-95R99
ICS Code: 31.100