This test method covers the measurement of the sheet resistance of metallic thin films with a collinear four-probe array. It is intended for use with rectangular metallic films formed by deposition of a material or by a thinning process and supported by an insulating substrate. This test method is suitable for referee measurement purposes as well as for routine acceptance measurements. A collinear four-probe array is used to determine the sheet resistance by passing a measured direct current through the specimen between the outer probes and measuring the resulting potential difference between the inner probes. The sheet resistance is calculated from the measured current and potential values using correction factors associated with the geometry of the specimen and the probe spacing. The accuracy of the electrical measuring equipment is tested by means of an analog circuit containing a known standard resistor together with other resistors which simulate the resistance at the contacts between the probe tips and the film surface.
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1.1 This test method covers the measurement of the sheet resistance of metallic thin films with a collinear four-probe array. It is intended for use with rectangular metallic films between 0.01 and 100 [mu]m thick, formed by deposition of a material or by a thinning process and supported by an insulating substrate, in the sheet resistance range from 10 to 10 [omega]/[open-box] (see 3.1.3).
1.2 This test method is suitable for referee measurement purposes as well as for routine acceptance measurements.
1.3 The values stated in Si units are to be regarded as the standard. The values given in parentheses are for information only.
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
E2251 Specification for Liquid-in-Glass ASTM Thermometers with Low-Hazard Precision Liquids
F388 Method for Measurement of Oxide Thickness on Silicon Wafers and Metallization Thickness by Multiple-Beam Interference (Tolansky Method) (Withdrawn 1993) Withdrawn. THe last approved version of this historical standard is referenced on www.astm.org.
collinear four-point probe; electrical resistance; electrical sheet resistance; four-point probe; resistance; thin films; thin conductive films; thin metallic films
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