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This specification covers sputtering targets fabricated from chromium metal for use in thin film applications. The grades of chromium covered in this specification, are based on the total metallic impurity content of the metallic elements, and are classified as 4N, 3N7, 3N5, 3N, and 2N8. Materials shall be tested using analytical methods such as combustion/infrared spectrometry, thermal conductivity, atomic absorption spectrometry, direct current plasma, inductively coupled plasma, and spark source mass spectroscopy or glow discharge mass spectroscopy; and the individual grades shall conform to specified values of chemical composition, density, grain size.
This abstract is a brief summary of the referenced standard. It is informational only and not an official part of the standard; the full text of the standard itself must be referred to for its use and application. ASTM does not give any warranty express or implied or make any representation that the contents of this abstract are accurate, complete or up to date.
1.1 This specification covers sputtering targets fabricated from chromium metal.
1.2 This specification sets purity grade levels, physical attributes, analytical methods and packaging requirements.
1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
E112 Test Methods for Determining Average Grain Size
ICS Number Code 25.220.40 (Metallic coatings)
UNSPSC Code 32131012(Sputtering targets)
ASTM F1367-98(2011), Standard Specification for Chromium Sputtering Targets for Thin Film Applications, ASTM International, West Conshohocken, PA, 2011, www.astm.orgBack to Top