Auger analysis is used to determine the elemental composition of the first several atomic layers, typically 1 to 5 nm thick, of a specimen surface. In conjunction with inert gas ion sputtering, it is used to determine the sputter depth profile to a depth of a few micrometres.

The specimen is normally a solid conductor, semiconductor, or insulator. For insulators, provisions may be required for control of charge accumulation at the surface (see Guide E 1523). Typical applications include the analysis of surface contaminants, thin film deposits or segregated overlayers on metallic or alloy substrates. The specimen topography may vary from a smooth, polished specimen to a rough fracture surface.

Auger analysis of specimens with volatile species that evaporate in the ultra-high vacuum environment of the Auger chamber and substances which are susceptible to electron or X-ray beam damage, such as organic compounds, may require special techniques not covered herein. (See Guide E 983.)

1. Scope

1.1 This practice outlines the necessary steps for the identification of elements in a given Auger spectrum obtained using conventional electron spectrometers. Spectra displayed as either the electron energy distribution (direct spectrum) or the first derivative of the electron energy distribution are considered.

1.2 This practice applies to Auger spectra generated by electron or X-ray bombardment of the specimen surface and can be extended to spectra generated by other methods such as ion bombardment.

1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.

1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.

ASTM Standards

E673 Terminology Relating to Surface Analysis

E983 Guide for Minimizing Unwanted Electron Beam Effects in Auger Electron Spectroscopy

E984 Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy

E1523 Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy

ISO Standards

Keywords

AES; Auger electron spectroscopy; spectroscopy; surface analysis; Surface analysis--spectrochemical analysis; Auger electron spectroscopy (AES);

ICS Code

ICS Number Code 71.040.50 (Physicochemical methods of analysis)

Citing ASTM Standards

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