This practice describes a simple and approximate method for determining the current density distribution of ion beams. Formerly under the jurisdiction of Committee E42 on Surface Analysis, this practice was withdrawn in November 2012 and replaced by Guide E1577 on Reporting of Ion Beam Parameters Used in Surface Analysis.
1.1 This practice describes a simple and approximate method for determining the shape and current density of ion beams. The practice is limited to ion beams of diameter greater than 0.5 mm of the type used for sputtering of solid surfaces to obtain sputter depth profiles. It is assumed that the ion-beam current density is symmetrical about the beam axis.
1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
E673 Terminology Relating to Surface Analysis
E1127 Guide for Depth Profiling in Auger Electron Spectroscopy
E1577 Guide for Reporting of Ion Beam Parameters Used in Surface Analysis
ion beam sputtering;
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Citing ASTM Standards
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