| ||Format||Pages||Price|| |
|2||$39.00||  ADD TO CART|
|Hardcopy (shipping and handling)||2||$39.00||  ADD TO CART|
1.1 This standard consists of terms and definitions pertaining to measurements taken on thin, reflecting films, such as found in microelectromechanical systems (MEMS) materials. In particular, the terms are related to the standards in Section 2, which were generated by Committee E08 on Fatigue and Fracture. Terminology E1823 Relating to Fatigue and Fracture Testing is applicable to this standard.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
E1823 Terminology Relating to Fatigue and Fracture Testing
E2244 Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer
E2245 Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer
E2246 Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer
ICS Number Code 01.040.31 (Electronics (Vocabularies)); 31.240 (Mechanical structures for electronic equipment)
UNSPSC Code 32111700(Semiconductor devices)
ASTM E2444-11e1, Terminology Relating to Measurements Taken on Thin, Reflecting Films, ASTM International, West Conshohocken, PA, 2011, www.astm.orgBack to Top