ASTM E2444 - 11e1

    Terminology Relating to Measurements Taken on Thin, Reflecting Films

    Active Standard ASTM E2444 | Developed by Subcommittee: E08.02

    Book of Standards Volume: 03.01


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    1. Scope

    1.1 This standard consists of terms and definitions pertaining to measurements taken on thin, reflecting films, such as found in microelectromechanical systems (MEMS) materials. In particular, the terms are related to the standards in Section 2, which were generated by Committee E08 on Fatigue and Fracture. Terminology E1823 Relating to Fatigue and Fracture Testing is applicable to this standard.

    1.2 The terms are listed in alphabetical order.


    2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.

    ASTM Standards

    E1823 Terminology Relating to Fatigue and Fracture Testing

    E2244 Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer

    E2245 Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer

    E2246 Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer


    ICS Code

    ICS Number Code 01.040.31 (Electronics (Vocabularies)); 31.240 (Mechanical structures for electronic equipment)

    UNSPSC Code

    UNSPSC Code 32111700(Semiconductor devices)


    DOI: 10.1520/E2444-11E01

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    ASTM E2444

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