ASTM D5127 - 13

    Standard Guide for Ultra-Pure Water Used in the Electronics and Semiconductor Industries

    Active Standard ASTM D5127 | Developed by Subcommittee: D19.02

    Book of Standards Volume: 11.01


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    Significance and Use

    4.1 This guide recommends the water quality required for the electronics and microelectronics industries. High-purity water is required to prevent contamination of products during manufacture, since contamination can lead to an unacceptable, low yield of electronic devices.

    4.2 The range of water purity is defined in accordance with the manufacturing process. The types of ultra-pure water are defined with respect to device line width. In all cases, the water-quality recommendations apply at the point of distribution.

    4.3 The limits on the impurities are related to current contamination specifications and to available analytical methods (either performed in a suitable clean laboratory or by on-line instrumentation). On-line and off-line methods are used in accordance with current industry practice. Concentration of the sample may be required to measure the impurities at the levels indicated in Table 1.

    TABLE 1 Requirements for Water at the Point of Distribution in the Electronics and Semiconductor IndustriesA

    Parameter

    Type E-1

    Type E-1.1

    Type E-1.2B

    Type E-1.3B

    Type E-2

    Type E-3

    Type E-4

    Linewidth (microns)

    1.0–0.5

    0.35–0.25

    0.18–0.09

    0.065–0.032

    5.0–1.0

    >5.0

    Resistivity, 25°C (On-line)

    18.1

    18.2

    18.2

    18.2

    16.5

    12

    0.5

    TOC (μg/L) (on-line for <10 ppb)

    5

    2

    1

    1

    50

    300

    1000

    On-line dissolved oxygen (μg/L)

    25

    10

    3

    10

    On-Line Residue after evaporation (μg/L)

    1

    0.5

    0.1

     

    On-line particles/L (micron range)

     

     

     

     

     

     

     

    >0.05 μm

     

     

     

    500

     

     

     

     0.05–0.1

     

    1000

    200

    N/A

     0.1–0.2

    1000

    350

    <100

    N/A

      0.2–0.5

    500

    <100

    <10

    N/A

     0.5-1.0

    200

    <50

    <5

    N/A

     1.0

    <100

    <20

    <1

    N/A

    SEM particles/L (micron range)

     

     

     

     

     

     

     

     0.1–0.2

    1000

    700

    <250

    N/A

     0.2–0.5

    500

    400

    <100

    N/A

    3000

     0.5–1

    100

    50

    <30

    N/A

    10 000

     10

    <50

    <30

    <10

    N/A

    100 000

    Bacteria in CFU/Volume

     

     

     

     

     

     

     

     100 mL Sample

    5

    3

    1

    N/A

    10

    50

    100

     1 L Sample

     

     

    10

    1

     

     

     

    10 L Sample

     

     

     

    1

     

     

     

    Silica – total (μg/L)

    5

    3

    1

    0.5

    10

    50

    1000

    Silica – dissolved (μg/L)

    3

    1

    0.5

    0.5

    Anions and Ammonium by IC (μg/L)

     

     

     

     

     

     

     

     Ammonium

    0.1

    0.10

    0.05

    0.050

     Bromide

    0.1

    0.05

    0.02

    0.050

     Chloride

    0.1

    0.05

    0.02

    0.050

    1

    10

    1000

     Fluoride

    0.1

    0.05

    0.03

    0.050

     Nitrate

    0.1

    0.05

    0.02

    0.050

    1

    5

    500

     Nitrite

    0.1

    0.05

    0.02

    0.050

     Phosphate

    0.1

    0.05

    0.02

    0.050

    1

    5

    500

     Sulfate

    0.1

    0.05

    0.02

    0.050

    1

    5

    500

    Metals by ICP/MS (μg/L)

     

     

     

     

     

     

     

     Aluminum

    0.05

    0.02

    0.005

    0.001

    Antimony

     

     

     

    0.001

     

     

     

    Arsenic

     

     

     

    0.001

     

     

     

     Barium

    0.05

    0.02

    0.001

    0.001

     BoronC

    0.3

    0.1

    0.05

    0.050

    Cadmium

     

     

     

    0.010

     

     

     

     Calcium

    0.05

    0.02

    0.002

    0.001

     Chromium

    0.05

    0.02

    0.002

    0.001

     Copper

    0.05

    0.02

    0.002

    0.001

    1

    2

    500

     Iron

    1.1 This guide provides recommendations for water quality related to electronics and semiconductor-industry manufacturing. Seven classifications of water are described, including water for line widths as low as 0.032 micron. In all cases, the recommendations are for water at the point of distribution (POD).

    1.2 Water is used for washing and rinsing of semiconductor components during manufacture. Water is also used for cleaning and etching operations, making steam for oxidation of silicon surfaces, preparing photomasks, and depositing luminescent materials. Other applications are in the development and fabrication of solid-state devices, thin-film devices, communication lasers, light-emitting diodes, photo-detectors, printed circuits, memory devices, vacuum-tube devices, or electrolytic devices.

    1.3 Users needing water qualities different from those described here should consult other water standards, such as Specification D1193 and Guide D5196.

    1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

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    1. Scope

    1.1 This guide provides recommendations for water quality related to electronics and semiconductor-industry manufacturing. Seven classifications of water are described, including water for line widths as low as 0.032 micron. In all cases, the recommendations are for water at the point of distribution (POD).

    1.2 Water is used for washing and rinsing of semiconductor components during manufacture. Water is also used for cleaning and etching operations, making steam for oxidation of silicon surfaces, preparing photomasks, and depositing luminescent materials. Other applications are in the development and fabrication of solid-state devices, thin-film devices, communication lasers, light-emitting diodes, photo-detectors, printed circuits, memory devices, vacuum-tube devices, or electrolytic devices.

    1.3 Users needing water qualities different from those described here should consult other water standards, such as Specification D1193 and Guide D5196.

    1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.


    2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.

    ASTM Standards

    D1129 Terminology Relating to Water

    D1193 Specification for Reagent Water

    D1976 Test Method for Elements in Water by Inductively-Coupled Argon Plasma Atomic Emission Spectroscopy

    D2791 Test Method for On-line Determination of Sodium in Water

    D3919 Practice for Measuring Trace Elements in Water by Graphite Furnace Atomic Absorption Spectrophotometry

    D4191 Test Method for Sodium in Water by Atomic Absorption Spectrophotometry

    D4192 Test Method for Potassium in Water by Atomic Absorption Spectrophotometry

    D4327 Test Method for Anions in Water by Suppressed Ion Chromatography

    D4453 Practice for Handling of High Purity Water Samples

    D4517 Test Method for Low-Level Total Silica in High-Purity Water by Flameless Atomic Absorption Spectroscopy

    D5173 Test Method for On-Line Monitoring of Carbon Compounds in Water by Chemical Oxidation, by UV Light Oxidation, by Both, or by High Temperature Combustion Followed by Gas Phase NDIR or by Electrolytic Conductivity

    D5196 Guide for Bio-Applications Grade Water

    D5391 Test Method for Electrical Conductivity and Resistivity of a Flowing High Purity Water Sample

    D5462 Test Method for On-Line Measurement of Low-Level Dissolved Oxygen in Water

    D5542 Test Methods for Trace Anions in High Purity Water by Ion Chromatography

    D5544 Test Method for On-Line Measurement of Residue After Evaporation of High-Purity Water

    D5673 Test Method for Elements in Water by Inductively Coupled Plasma--Mass Spectrometry

    D5996 Test Method for Measuring Anionic Contaminants in High-Purity Water by On-Line Ion Chromatography

    D5997 Test Method for On-Line Monitoring of Total Carbon, Inorganic Carbon in Water by Ultraviolet, Persulfate Oxidation, and Membrane Conductivity Detection

    F1094 Test Methods for Microbiological Monitoring of Water Used for Processing Electron and Microelectronic Devices by Direct Pressure Tap Sampling Valve and by the Presterilized Plastic Bag Method


    ICS Code

    ICS Number Code 13.060.25 (Water for industrial use); 71.100.99 (Other products of the chemical industry)

    UNSPSC Code

    UNSPSC Code


    DOI: 10.1520/D5127-13

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