1.1 This guide provides recommendations for water quality related to electronics and semiconductor-industry manufacturing. Seven classifications of water are described, including water for line widths as low as 0.032 micron. In all cases, the recommendations are for water at the point of distribution (POD).
1.2 Water is used for washing and rinsing of semiconductor components during manufacture. Water is also used for cleaning and etching operations, making steam for oxidation of silicon surfaces, preparing photomasks, and depositing luminescent materials. Other applications are in the development and fabrication of solid-state devices, thin-film devices, communication lasers, light-emitting diodes, photo-detectors, printed circuits, memory devices, vacuum-tube devices, or electrolytic devices.
1.3 Users needing water qualities different from those described here should consult other water standards, such as Specification D1193 and Guide D5196.
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
D1129 Terminology Relating to Water
D1193 Specification for Reagent Water
D1976 Test Method for Elements in Water by Inductively-Coupled Argon Plasma Atomic Emission Spectroscopy
D2791 Test Method for On-line Determination of Sodium in Water
D3919 Practice for Measuring Trace Elements in Water by Graphite Furnace Atomic Absorption Spectrophotometry
D4191 Test Method for Sodium in Water by Atomic Absorption Spectrophotometry
D4192 Test Method for Potassium in Water by Atomic Absorption Spectrophotometry
D4327 Test Method for Anions in Water by Suppressed Ion Chromatography
D4453 Practice for Handling of High Purity Water Samples
D4517 Test Method for Low-Level Total Silica in High-Purity Water by Flameless Atomic Absorption Spectroscopy
D5173 Test Method for On-Line Monitoring of Carbon Compounds in Water by Chemical Oxidation, by UV Light Oxidation, by Both, or by High Temperature Combustion Followed by Gas Phase NDIR or by Electrolytic Conductivity
D5196 Guide for Bio-Applications Grade Water
D5391 Test Method for Electrical Conductivity and Resistivity of a Flowing High Purity Water Sample
D5462 Test Method for On-Line Measurement of Low-Level Dissolved Oxygen in Water
D5542 Test Methods for Trace Anions in High Purity Water by Ion Chromatography
D5544 Test Method for On-Line Measurement of Residue After Evaporation of High-Purity Water
D5673 Test Method for Elements in Water by Inductively Coupled Plasma--Mass Spectrometry
D5996 Test Method for Measuring Anionic Contaminants in High-Purity Water by On-Line Ion Chromatography
D5997 Test Method for On-Line Monitoring of Total Carbon, Inorganic Carbon in Water by Ultraviolet, Persulfate Oxidation, and Membrane Conductivity Detection
F1094 Test Methods for Microbiological Monitoring of Water Used for Processing Electron and Microelectronic Devices by Direct Pressure Tap Sampling Valve and by the Presterilized Plastic Bag Method
electronic; microelectronics; semiconductor; ultra-pure water;
ICS Number Code 13.060.25 (Water for industrial use); 71.100.99 (Other products of the chemical industry)
ASTM International is a member of CrossRef.
Citing ASTM Standards
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