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Symposium on Cleaning and Materials Processing for Electronics and Space Apparatus Pages: 256       Published: 1963

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Table of Contents

Introduction
Standing S.

Portable Low-Cost Polyethylene Ultraclean Assembly Areas
Trace C., White J., Rich C.

A New Principle for Airborne Contamination Control in Clean Rooms and Work Stations
Whitfield W., Mashburn J., Neitzel W.

A Comparison of Dust Count Data Obtained from Different Measuring Methods
Marsh R.

A Review of the Gravity-Settling Technique for Measuring Airborne Dust in Electron Device Processing Areas
Selby E.

Enumeration of Airborne Particulate Matter by the Scattered Light Technique
Pudvin J.

A Referee Method for Sizing and Counting of Airborne Particulate Contamination
Cotton R., Williamsen C.

Sizing and Counting Airborne Particulate Contamination in Clean Rooms and Other Dust-Controlled Areas Designed for Electronic and Similar Applications


The Silting Index: An Evaluation of Micron and Submicron Contamination in Liquids
Dwyer J.

Chemical Factors in the use and Handling of Electronic Grade Hydrogen Peroxide
Black R. P., Hawkinson A.

Effect of Temperature on Resistance of Ultrapure Organic Solvents
Balsbaugh Sydney, Smith Verity

Chemical Durability Evaluation of Electronic Glasses
Wiens B.

Methods of Evaluating Sonic Cleaning Systems
Farris J

Effect of Temperature on Ultrasonic Cavitation of Fluorinated Solvents
Smallwood J.

The Role of Cavitation in Sonic Energy Cleaning
Bulat T.

An Instrument for the Contactless Measurement of Minority Carrier Lifetime
Currin C., Smith F.

Photography and Metal Parts Production
Spear D.

An Ionized Gas Jet Surface Cleaner
Krieger G.

Characteristics of Frequency Control Devices for Satellite Environments
Spencer W., Reynolds R.

Doping of Germanium Transistor Surfaces by Fluid-Base Encapsulant Systems
Borofsky A., Partridge J.

Both Reversible and Permanent Effects of Moisture After Stress on Electrical Characteristics of Germanium Transistors
Partridge J., Borofsky A.

Some Experiments on Water Introduced Into Electron Tubes
Frost H.

Evaluation of Polycrystalline Silicon Batches for Czochralski Crystal Pulling
Kramer H.

Infrared-Tested Surface Properties of Semiconductor Wafers
Bogenschuetz A., Schuetze H.

Evaluation of Semiconductor Epitaxial Layers Report of Subcommittee 6 of ASTM Committee F-1
Rose A.

Modular Dopant for Silicon Czochralski Crystals
Smith C., Currin C.

The Preparation and Properties of Single Crystals of Aluminum Antimonide
Burns J., Telk C.

Committee: F01
Paper ID: STP342-EB
DOI: 10.1520/STP342-EB

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0-8031-6139-5
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STP342-EB