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SEDL / STP / STP300-EB
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STP300
Materials and Electron Device Processing
Standing S.
Pages: 271
Published: 1961
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Table of Contents
The Role of Impurities in Impurity-Dominated Electronic Materials and Devices
Biondi F.
Particulate Concentrations in Ultraclean Rooms
Van Luik F.
A Comparison of Electrostatic and High-Efficiency Impingement Air Filters for Use in Device Development Laboratories
Helmke G.
Dust Monitoring by the Dry Slide Settling Technique
Whitfield W., Marsh R., Kodel I.
An Approach to Control of Transistor Processing Environments
Smith C., Manns T.
Electron Beam Microanalyzer: A New Tool for Electron Device Development
Hayes J.
Detection of Inorganic Contamination on Surfaces by an EMF Measurement
Schimmel D.
Electrode Potential: A Tool for the Control of Materials and Processes in Electron Device Fabrication: I. EMF—Time Studies of Clean and Contaminated Platinum Electrodes
Feder D., Jacob E.
Electrode Potential: A Tool for the Control of Materials and Processes in Electron Device Fabrication: II. EMF Studies of the Behavior of 36 Per Cent Nickel-Iron Alloy in Hydrogen Peroxide — Formic Acid Etchants
Feder D., Howden W., Huff D., Richards J.
Use of Radioisotope Tracer Techniques in Contamination Studies
Bulat T.
Gas-Phase Proportional Counting: A Radiotracer Technique for Examination of Electronic Components and Materials
Stern H.
Fluorine Release from Glasses
Francel J.
Elimination of Contaminants from Electron Tube Components: Automation of Chemical Processing
Thomas C., Craft W., Koontz D.
Transducer Parameters Affecting Sonic Cleaning
Lyons L.
Removal of Water-Soluble Flux from Assembled Printed Circuit Boards
Smallwood J.
Size Distribution and Identification of Air-Borne Particulates
Allison F.
ARC Sealing of Borosilicate Glasses
Liebson M.
Recommended Practices for Safe Handling of Beryllium Oxide Ceramics
Ferreira L.
Beryllium Oxide Dielectric Heat Sinks for Electronic Devices
Hessinger P., Strott A., Haura B.
Sulfamic Acid Cleaning of Electron Tube Parts
Etter R.
A 24-Position Semiautomatic Vacuum Tube Exhaust Machine
Quaglia L., Byrne J., Reyling G.
Purification, Distribution, Control, and Monitoring of High-Purity Gases for Electron Device Processing
Rogers M.
Comparison of Standard Leak Rates Measured by Viscous and Molecular Flow Techniques
Maurer D.
Gas Composition During Pumping and in Sealed-off Power Tubes
Váradi P., Langer H., Saltzman M.
Determination of Trace Amounts of Oxygen in Protective Gaseous Ambients
Feder D., Craft W.
Mass Spectrometric Studies of Power Klystron Exhaust Processing
Noble L., Waits R.
Quality Control of Getters
Della Porta P., Airoldi E.
Residual Gas Content as a Function of Tube Processing
Frost H.
Changes in Stability of Germanium Alloy Transistors Through Etching, Washing, and Encapsulation Processing
Borofsky A.
Effects of Various Cleaning Methods on Electronic Components in the Micromodule
Vossen J.
Noise-Tested Cathode Activation
Dlouhy F., Schuetze H.
Appendix: Organization of Committee F-1 on Materials for Electron Tubes and Semiconductor Devices
Committee: F01
Paper ID: STP300-EB
DOI: 10.1520/STP300-EB
ISBN-EB: 978-0-8031-5963-1
 ASTM International is a member of CrossRef.
0-8031-6117-4
978-0-8031-6117-7
STP300-EB
STP 300
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