Materials and Electron Device Processing

    Standing S.
    Published: 1961

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    Table of Contents

    The Role of Impurities in Impurity-Dominated Electronic Materials and Devices
    Biondi F.

    Particulate Concentrations in Ultraclean Rooms
    Van Luik F.

    A Comparison of Electrostatic and High-Efficiency Impingement Air Filters for Use in Device Development Laboratories
    Helmke G.

    Dust Monitoring by the Dry Slide Settling Technique
    Kodel I., Marsh R., Whitfield W.

    An Approach to Control of Transistor Processing Environments
    Manns T., Smith C.

    Electron Beam Microanalyzer: A New Tool for Electron Device Development
    Hayes J.

    Detection of Inorganic Contamination on Surfaces by an EMF Measurement
    Schimmel D.

    Electrode Potential: A Tool for the Control of Materials and Processes in Electron Device Fabrication: I. EMF—Time Studies of Clean and Contaminated Platinum Electrodes
    Feder D., Jacob E.

    Electrode Potential: A Tool for the Control of Materials and Processes in Electron Device Fabrication: II. EMF Studies of the Behavior of 36 Per Cent Nickel-Iron Alloy in Hydrogen Peroxide — Formic Acid Etchants
    Feder D., Howden W., Huff D., Richards J.

    Use of Radioisotope Tracer Techniques in Contamination Studies
    Bulat T.

    Gas-Phase Proportional Counting: A Radiotracer Technique for Examination of Electronic Components and Materials
    Stern H.

    Fluorine Release from Glasses
    Francel J.

    Elimination of Contaminants from Electron Tube Components: Automation of Chemical Processing
    Craft W., Koontz D., Thomas C.

    Transducer Parameters Affecting Sonic Cleaning
    Lyons L.

    Removal of Water-Soluble Flux from Assembled Printed Circuit Boards
    Smallwood J.

    Size Distribution and Identification of Air-Borne Particulates
    Allison F.

    ARC Sealing of Borosilicate Glasses
    Liebson M.

    Recommended Practices for Safe Handling of Beryllium Oxide Ceramics
    Ferreira L.

    Beryllium Oxide Dielectric Heat Sinks for Electronic Devices
    Haura B., Hessinger P., Strott A.

    Sulfamic Acid Cleaning of Electron Tube Parts
    Etter R.

    A 24-Position Semiautomatic Vacuum Tube Exhaust Machine
    Byrne J., Quaglia L., Reyling G.

    Purification, Distribution, Control, and Monitoring of High-Purity Gases for Electron Device Processing
    Rogers M.

    Comparison of Standard Leak Rates Measured by Viscous and Molecular Flow Techniques
    Maurer D.

    Gas Composition During Pumping and in Sealed-off Power Tubes
    Langer H., Saltzman M., Váradi P.

    Determination of Trace Amounts of Oxygen in Protective Gaseous Ambients
    Craft W., Feder D.

    Mass Spectrometric Studies of Power Klystron Exhaust Processing
    Noble L., Waits R.

    Quality Control of Getters
    Airoldi E., Della Porta P.

    Residual Gas Content as a Function of Tube Processing
    Frost H.

    Changes in Stability of Germanium Alloy Transistors Through Etching, Washing, and Encapsulation Processing
    Borofsky A.

    Effects of Various Cleaning Methods on Electronic Components in the Micromodule
    Vossen J.

    Noise-Tested Cathode Activation
    Dlouhy F., Schuetze H.

    Appendix: Organization of Committee F-1 on Materials for Electron Tubes and Semiconductor Devices

    Committee: F01

    DOI: 10.1520/STP300-EB

    ISBN-EB: 978-0-8031-5963-1

    ISBN-13: 978-0-8031-6117-7

    ASTM International is a member of CrossRef.