STP572

    The Evaluation of Thin Silicon Layers by Spreading Resistance Measurements

    Published: Jan 1974


      Format Pages Price  
    PDF Version (312K) 8 $25   ADD TO CART
    Complete Source PDF (6.3M) 8 $86   ADD TO CART


    Abstract

    The spreading resistance measurement technique is the only one capable of providing precise thickness measurements and detailed concentration profiles on any type of active device layer or structure formed in silicon on a routine basis. The methods employed in the evaluation of thin layer structures of the type used for microwave devices is discussed and the application of these methods to thin NN+, P+NN+ and P+N silicon structures formed by combinations of diffusion, epitaxy and ion implantation is illustrated.

    Keywords:

    Diffusion, epitaxy, ion implantation, microwave devices, profiling, spreading resistance, thin silicon layers


    Author Information:

    Gruber, Gilbert A.
    Solid State Measurements, Inc., Monroeville, Pennsylvania

    Pfeifer, Robert F.
    NCR Microelectronics Division, Miamisburg, Ohio


    Paper ID: STP47409S

    Committee/Subcommittee: F01.15

    DOI: 10.1520/STP47409S


    CrossRef ASTM International is a member of CrossRef.