SEDL / STP / STP689-EB / STP39116S

Ultraviolet Damage Resistance of Laser Coatings

Newnam, BE
Los Alamos Scientific Laboratory, Los Alamos, New Mexico

Gill, DH
Los Alamos Scientific Laboratory, Los Alamos, New Mexico

Pages: 12    Published: Jan 1979

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Abstract

The damage resistance of several thin-film materials used in ultraviolet laser optics was measured at 266 nm and 355 nm. The coatings included single, quarter-wave (QW) layers of NaF, LaF³, MgF², Tho², AI²O³, HfO², ZrO², Y²O³ and SiO², plus multilayer reflectors composed of some of these materials. The substrates were uv-grade fused silica. Single-shot thresholds were obtained with 22-ns and 27-ns (FWHM) pulses at 266 and 355 nm, respectively. One of the samples had previously been tested using 20-ps pulses, providing a pulsewidth comparison.