STP689: Ultraviolet Damage Resistance of Laser Coatings

    Newnam, BE
    Los Alamos Scientific Laboratory, Los Alamos, New Mexico

    Gill, DH
    Los Alamos Scientific Laboratory, Los Alamos, New Mexico

    Pages: 12    Published: Jan 1979


    Abstract

    The damage resistance of several thin-film materials used in ultraviolet laser optics was measured at 266 nm and 355 nm. The coatings included single, quarter-wave (QW) layers of NaF, LaF3, MgF2, Tho2, AI2O3, HfO2, ZrO2, Y2O3 and SiO2, plus multilayer reflectors composed of some of these materials. The substrates were uv-grade fused silica. Single-shot thresholds were obtained with 22-ns and 27-ns (FWHM) pulses at 266 and 355 nm, respectively. One of the samples had previously been tested using 20-ps pulses, providing a pulsewidth comparison.

    Keywords:

    damage thresholds, electric fields, laser damage, nanosecond pulses, pulsewidth dependence, standing waves, thin-film coatings, two-photon absorption, ultraviolet wavelength scaling


    Paper ID: STP39116S

    Committee/Subcommittee: F01.02

    DOI: 10.1520/STP39116S


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