SYMPOSIA PAPER Published: 01 January 1979
STP39116S

Ultraviolet Damage Resistance of Laser Coatings

Source

The damage resistance of several thin-film materials used in ultraviolet laser optics was measured at 266 nm and 355 nm. The coatings included single, quarter-wave (QW) layers of NaF, LaF3, MgF2, Tho2, AI2O3, HfO2, ZrO2, Y2O3 and SiO2, plus multilayer reflectors composed of some of these materials. The substrates were uv-grade fused silica. Single-shot thresholds were obtained with 22-ns and 27-ns (FWHM) pulses at 266 and 355 nm, respectively. One of the samples had previously been tested using 20-ps pulses, providing a pulsewidth comparison.

Author Information

Newnam, BE
Gill, DH
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Details
Developed by Committee: F01
Pages: 190–201
DOI: 10.1520/STP39116S
ISBN-EB: 978-0-8031-5578-7
ISBN-13: 978-0-8031-0085-5