SEDL / STP / STP799-EB / STP37270S

Preparation of Thin Amorphous Films by E-Beam Evaporation from Multiple Sources

Farabaugh, EN
National Bureau of Standards, Washington, D.C.

Sanders, DM
National Bureau of Standards, Washington, D.C.

Wilke, ME
National Bureau of Standards, Washington, D.C.

Hurwitz, SA
National Bureau of Standards, Washington, D.C.

Haller, WK
National Bureau of Standards, Washington, D.C.

Pages: 8    Published: Jan 1983

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Abstract

E-beam codeposition was used to produce thin films in the system ZrO²-SiO². Bk-7 glass, heated to 325 °C was used as substrate material for these depositions. The films, thus produced were studied by X-ray Diffraction and Scanning Electron Microscopy Techniques. These studies yielded information on the dependence of film crystallinity on composition and substrate temperature. Particular attention was paid to the compositional range in which the structure of the film changes from polycrystalline to amorphous. The change in film structure is easily determined from the change in the XRD patterns. Different film structures were observed using SEM methods.