STP799: Degradation of Dielectric Films by XeF Excimer Intermediates

    Loudiana, M
    Washington State University, Pullman, Washington,

    Schmid, A
    Washington State University, Pullman, Washington,

    Dickinson, JT
    Washington State University, Pullman, Washington,

    Pages: 7    Published: Jan 1983


    Abstract

    Many excimer laser designs require optical component surfaces to be in contact with both optical radiation and reactive components of the gain medium. The resulting environmental degradation of coatings on mirrors or windows is analyzed by isolating intermediates from the XeF gain medium and measuring quantitatively corrosive interaction between these species and the dielectric surfaces. Particular attention will be given to SiO2 films whose reaction with XeF2 and NF2 with and without additional stimulation by ions will be surveyed. Temperature effects of the film substrate as well as the importance of synergistic effects for the stability of the SiO2 coatings will be discussed.

    Keywords:

    UV mirrors, excimer lasers, laser material degradation, chemical sputtering


    Paper ID: STP37261S

    Committee/Subcommittee: F01.02

    DOI: 10.1520/STP37261S


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