STP759: Survey of Damage Thresholds at 532 NM for Production-RUN optical Components

    Deaton, TF
    University of California, Lawrence Livermore National Laboratory, Livermore, California

    Rainer, F
    University of California, Lawrence Livermore National Laboratory, Livermore, California

    Milam, D
    University of California, Lawrence Livermore National Laboratory, Livermore, California

    Smith, WL
    University of California, Lawrence Livermore National Laboratory, Livermore, California

    Pages: 3    Published: Oct 1981


    Abstract

    We report the results of a survey of 532-nm, 0.7-ns damage thresholds for a variety of optical components. The optics were all samples from current production runs, which included high-reflector and anti-reflector films, beam dumps, leached AR surfaces, and multiwavelength AR and HR films.

    The experiment was similar to the usual 1064-nm damage measurement. The green light pulses were produced by frequency-doubling 1-ns pulses from a Nd:glass laser. The 532-nm beam was then focused to a spot size of about 2 mm diameter at the sample. Beam profiles were recorded on a vidicon and on 1-Z photographic plates.

    Thresholds for the AR and HR films were typically 2–5 J/cm2, somehwat lower than might have been expected. Some of the beam dumps damaged at 2 J/cm2. Bare and graded-index surface thresholds were found to be comparable to 1-ns, 1064-nm thresholds.

    Keywords:

    Laser-induced damage, pulsed lasers


    Paper ID: STP37020S

    Committee/Subcommittee: F01.02

    DOI: 10.1520/STP37020S


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