SEDL / STP / STP759-EB / STP37020S

Survey of Damage Thresholds at 532 NM for Production-RUN optical Components

Deaton, TF
University of California, Lawrence Livermore National Laboratory, Livermore, California

Rainer, F
University of California, Lawrence Livermore National Laboratory, Livermore, California

Milam, D
University of California, Lawrence Livermore National Laboratory, Livermore, California

Smith, WL
University of California, Lawrence Livermore National Laboratory, Livermore, California

Pages: 3    Published: Oct 1981

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Abstract

We report the results of a survey of 532-nm, 0.7-ns damage thresholds for a variety of optical components. The optics were all samples from current production runs, which included high-reflector and anti-reflector films, beam dumps, leached AR surfaces, and multiwavelength AR and HR films.

The experiment was similar to the usual 1064-nm damage measurement. The green light pulses were produced by frequency-doubling 1-ns pulses from a Nd:glass laser. The 532-nm beam was then focused to a spot size of about 2 mm diameter at the sample. Beam profiles were recorded on a vidicon and on 1-Z photographic plates.

Thresholds for the AR and HR films were typically 2–5 J/cm², somehwat lower than might have been expected. Some of the beam dumps damaged at 2 J/cm². Bare and graded-index surface thresholds were found to be comparable to 1-ns, 1064-nm thresholds.