SYMPOSIA PAPER Published: 01 January 1983
STP36188S

Computerized Electron-Beam Linewidth Measuring and Inspection: A New Tool

Source

This paper describes a field emission linewidth measuring and inspection instrument. The low-voltage operation, which allows nondestructive measurement of critical dimensions on photoresist with good precision, is described. The effect on photoresist of nonpenetrating electrons in the low-voltage mode versus penetrating electrons in the high-voltage mode is discussed.

Author Information

Pomposo, TF
Nanometrics, Inc., Sunnyvale, Calif.
Coates, VJ
Nanometrics, Inc., Sunnyvale, Calif.
Price: $25.00
Contact Sales
Related
Reprints and Permissions
Reprints and copyright permissions can be requested through the
Copyright Clearance Center
Details
Developed by Committee: F01
Pages: 501–508
DOI: 10.1520/STP36188S
ISBN-EB: 978-0-8031-4871-0
ISBN-13: 978-0-8031-0243-9