SEDL / STP / STP804-EB / STP36188S

Computerized Electron-Beam Linewidth Measuring and Inspection: A New Tool

Pomposo, TF
Product Marketing Manager and President, Nanometrics, Inc., Sunnyvale, Calif.

Coates, VJ
Product Marketing Manager and President, Nanometrics, Inc., Sunnyvale, Calif.

Pages: 8    Published: Jan 1983

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Abstract

This paper describes a field emission linewidth measuring and inspection instrument. The low-voltage operation, which allows nondestructive measurement of critical dimensions on photoresist with good precision, is described. The effect on photoresist of nonpenetrating electrons in the low-voltage mode versus penetrating electrons in the high-voltage mode is discussed.