Digital Library / STP / STP804-EB / STP36188S


Computerized Electron-Beam Linewidth Measuring and Inspection: A New Tool

Pomposo, TF
Product Marketing Manager and President,Nanometrics, Inc.,Calif.,

Coates, VJ
Product Marketing Manager and President,Nanometrics, Inc.,Calif.,


Pages: 8    Published: Jan 1983


Download this paper for $25 PDF (400K)          View License Agreement
        Click here to download the complete source publication for $66 PDF (9.2M)


Source: STP804-EB


Abstract

This paper describes a field emission linewidth measuring and inspection instrument. The low-voltage operation, which allows nondestructive measurement of critical dimensions on photoresist with good precision, is described. The effect on photoresist of nonpenetrating electrons in the low-voltage mode versus penetrating electrons in the high-voltage mode is discussed.


Keywords:
scanning electron microscope, linewidth measurement, photoresist critical-dimension measurement, field emission source, field emission gun

Paper ID: STP36188S
Committee/Subcommittee: F01.06
DOI: 10.1520/STP36188S
CrossRef ASTM International is a member of CrossRef.